dc.contributor.author | Öztürk, S. | |
dc.contributor.author | Şentürk, E. | |
dc.contributor.author | Erkovan, M. | |
dc.contributor.author | Okutan, M. | |
dc.contributor.author | Kösemen, A. | |
dc.contributor.author | Şahin, Y. | |
dc.date.accessioned | 2021-04-28T11:45:54Z | |
dc.date.available | 2021-04-28T11:45:54Z | |
dc.date.issued | 2015 | en_US |
dc.identifier.citation | ÖZTÜRK, S., E. ŞENTÜRK, M. ERKOVAN, M. OKUTAN, A. KÖSEMEN & Y. ŞAHİN. "Cobalt–Titanium Multilayer Thin Films: Effect of Thickness of Titanium Spacer Layer on Impedance Properties". Materials Science in Semiconductor Processing, 30 (2015): 482-485. | en_US |
dc.identifier.uri | https://hdl.handle.net/11352/3379 | |
dc.description.abstract | We investigated the impedance parameterS of cobalt–titanium(Co–Ti) multilayer thin
Films deposited on native oxidized Si (100) substrate under ultra-high vacuum
(4 10 8 mbar) by magnetron sputtering at room temperature.Electrical properties of
Co/Ti/Co multilayer films were analyzed depending on the thickness of Ti spacer layer
With the impedance spectroscopy as a function of frequency .Co/Ti multilayer films
Exhibited dielectric relaxation in both real and imaginary part of dielectric constants at
the kilohertz frequency region and piezoelectric properties at the megahertz frequency
region. We determined that the fabricated multilayer films have complex and super
imposed type behavior when DC conductivity is used at lower frequency,resonance event
and relaxation properties. | en_US |
dc.language.iso | eng | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.isversionof | 10.1016/j.mssp.2014.10.053 | en_US |
dc.rights | info:eu-repo/semantics/embargoedAccess | en_US |
dc.subject | Multilayer Thin Films | en_US |
dc.subject | Piezoelectric | en_US |
dc.subject | Impedance Spectroscopy | en_US |
dc.subject | Dielectric Properties | en_US |
dc.title | Cobalt–Titanium Multilayer Thin Films: Effect of Thickness of Titanium Spacer Layer on Impedance Properties | en_US |
dc.type | article | en_US |
dc.relation.journal | Materials Science in Semiconductor Processing | en_US |
dc.contributor.department | FSM Vakıf Üniversitesi, Mühendislik Fakültesi, İnşaat Mühendisliği Bölümü | en_US |
dc.identifier.volume | 30 | en_US |
dc.identifier.startpage | 482 | en_US |
dc.identifier.endpage | 485 | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.contributor.institutionauthor | Öztürk, S. | |